Design and performance of capping layers for EUV multilayer mirrors

被引：36

作者：

Bajt, S ^{[1
]}

Chapman, HN ^{[1
]}

Nguyen, N ^{[1
]}

Alameda, J ^{[1
]}

Robinson, JC ^{[1
]}

Malinowski, M ^{[1
]}

Gullikson, E ^{[1
]}

Aquila, A ^{[1
]}

Tarrio, C ^{[1
]}

Grantham, S ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2 | 2003年 / 5037卷

关键词：

extreme ultraviolet (EUV) lithography; multilayers; optics; capping layer; ruthenium; oxidation resistance; reflectivity;

D O I：

10.1117/12.484966

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multilayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.

引用

页码：236 / 248

页数：13

共 26 条

[1]

[Anonymous], ASET SEMATECH WORKSH

[2] Improved reflectance and stability of Mo-Si multilayers [J].

Bajt, S ;

Alameda, JB ;

Barbee, TW ;

Clift, WM ;

Folta, JA ;

Kaufmann, B ;

Spiller, EA .

OPTICAL ENGINEERING, 2002, 41 (08) :1797-1804

[3] Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors [J].

Braun, S ;

Mai, H ;

Moss, M ;

Scholz, R ;

Leson, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (6B) :4074-4081

[4] Advances in multilayer reflective coatings for extreme-ultraviolet lithography [J].

Folta, JA ;

Bajt, S ;

Barbee, TW ;

Grabner, RF ;

Mirkarimi, PB ;

Nguyen, T ;

Schmidt, MA ;

Spiller, E ;

Walton, CC ;

Wedowski, M ;

Montcalm, C .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :702-709

[5] RADIATION HARDNESS OF MOLYBDENUM SILICON MULTILAYERS DESIGNED FOR USE IN A SOFT-X-RAY PROJECTION LITHOGRAPHY SYSTEM [J].

GAINES, DP ;

SPITZER, RC ;

CEGLIO, NM ;

KRUMREY, M ;

ULM, G .

APPLIED OPTICS, 1993, 32 (34) :6991-6998

[6] Radio-frequency discharge cleaning of silicon-capped Mo/Si multilayer extreme ultraviolet optics [J].

Graham, S ;

Steinhaus, C ;

Clift, M ;

Klebanoff, L .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06) :2393-2400

[7]

HUDYMA R, 2002, SPIE, V4832, P137

[8]

Hudyma R, 2000, Patent No. 6033079

[9]

Hudyma R, 2001, Patent No. [6188513B1, 6188513]

[10] Environmental data from the Engineering Test Stand [J].

Klebanoff, LE ;

Grunow, PA ;

Graham, S ;

Cliff, WM ;

Leung, AH ;

Haney, SJ .

EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 :310-315

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