Optical properties of gallium oxide films deposited by electron-beam evaporation

被引:98
作者
Al-Kuhaili, MF [1 ]
Durrani, SMA
Khawaja, EE
机构
[1] King Fahd Univ Petr & Minerals, Dept Phys, Dhahran 31261, Saudi Arabia
[2] King Fahd Univ Petr & Minerals, Res Inst, Ctr Appl Phys Sci, Dhahran 31261, Saudi Arabia
关键词
D O I
10.1063/1.1630845
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin films of gallium oxide were deposited by electron-beam evaporation on unheated substrates. Samples were deposited either without oxygen, or under an oxygen partial pressure of 5x10(-4) mbar. The films were amorphous. Films deposited with oxygen were stoichiometric, whereas those deposited without oxygen were substoichiometric. The optical properties of the films were derived from measurements, at normal incidence, of transmittance and reflectance. Films deposited without oxygen had higher values of the refractive index and extinction coefficient. The energy gaps were 5.04 and 4.84 eV for films deposited with and without oxygen, respectively. (C) 2003 American Institute of Physics.
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页码:4533 / 4535
页数:3
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