Deposition of Fe clusters on Si surfaces

被引：25

作者：

Upward, MD ^{[1
]}

Cotier, BN

Moriarty, P

Beton, PH

Baker, SH

Binns, C

Edmonds, K

机构：

[1] Univ Nottingham, Sch Phys & Astron, Nottingham NG7 2RD, England

[2] Univ Leicester, Dept Phys & Astron, Leicester LE1 7RH, Leics, England

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 06期

关键词：

D O I：

10.1116/1.1320808

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have used an ultrahigh vacuum scanning tunneling microscope to investigate the deposition of mesoscopic iron clusters from a gas aggregation source. The size of the clusters was found to be in the range 1-7 nm. The effect of exposure of the iron clusters to the atmosphere results in a significant increase in cluster size, which we believe is consistent with total oxidation of the clusters. A specially designed quadrupole mass filter is incorporated inside the cluster source. We have investigated the sizes of the clusters deposited using different quadrupole settings and find that it is possible to size select the clusters prior to deposition. Finally we have studied the effect of sample surface reactivity and annealing on cluster distribution. (C) 2000 American Vacuum Society. [S0734-211X(00)10606-7].

引用

页码：2646 / 2649

页数：4

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