Confocal Raman microprobe of lattice damage in N+ implanted 6H-SiC

被引:10
作者
Mestres, N
Alsina, F
Campos, FJ
Pascual, J
Morvan, E
Godignon, P
Millán, J
机构
[1] CSIC, Inst Ciencia Mat Barcelona, ES-08193 Bellaterra, Spain
[2] Univ Autonoma Barcelona, Dept Fis, ES-08193 Bellaterra, Spain
[3] CSIC, Ctr Nacl Microelect, ES-08193 Bellaterra, Spain
来源
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2 | 2000年 / 338-3卷
关键词
ion implantation; radiation damage; Raman scattering;
D O I
10.4028/www.scientific.net/MSF.338-342.663
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated the defect accumulation and amorphisation in N-14(+) implanted 6H-SiC as a function of ion fluence using confocal micro-Raman scattering. Raman spectra are very sensitive to changes in the chemical short-range order and to the formation of Si-Si- and C-C-bonds, which are not present in the unimplanted material. The technique also allowed the determination of the optical absorption coefficient. It increases proportional to the ion dose until the formation of the amorphous layer, and this increase is related to the formation of absorbing centers.
引用
收藏
页码:663 / 666
页数:4
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