Optical properties of polycrystalline and epitaxial anatase and rutile TiO2 thin films by rf magnetron sputtering

被引:178
作者
Tanemura, S
Miao, L
Jin, P
Kaneko, K
Terai, A
Nabatova-Gabain, N
机构
[1] Nagoya Inst Technol, Dept Environm Technol & Urban Planning, Showa Ku, Nagoya, Aichi 4668555, Japan
[2] Natl Inst Adv Ind Sci & Technol, Inst Struct & Engn Mat, Moriyama Ku, Nagoya, Aichi 4638560, Japan
[3] Kyushu Univ, Dept Mat Sci, Higashi Ku, Fukuoka 8128581, Japan
[4] Kyushu Univ, Engn HVEM Lab, Higashi Ku, Fukuoka 8128581, Japan
[5] Horiba Jobin Yvon Co Ltd, Chiyoda Ku, Tokyo 1010031, Japan
关键词
SE; TiO2; thin film; complex refractive index; optical band gap;
D O I
10.1016/S0169-4332(03)00015-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We analyzed successfully the refractive index n, extinction coefficient k, and optical band gap E-g of the fabricated polycrystallime and epitaxial TiO2 films of rutile and anatase films by spectroscopic ellipsometry (SE). The provided samples were prepared by rf magnetron sputtering of TiO2 target with Ar gas plasma under a variety of sputtering parameters such as total pressure, At gas flow rate, O-2 gas flow rate, applied sputtering power, substrate temperature and substrate materials. The covered wavelength for SE was from 0.75 to 5 eV (1653-248 nm in wavelength). As the conclusion, the films show higher values of refractive indices than the previously reported ones by other authors. Optical band gaps extrapolated by Tauc plot using the obtained extinction coefficient again show higher values than the known bulk data. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:654 / 660
页数:7
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