Electron transport through a single InAs quantum dot

被引:37
作者
Schmidt, KH [1 ]
Versen, M [1 ]
Kunze, U [1 ]
Reuter, D [1 ]
Wieck, AD [1 ]
机构
[1] Ruhr Univ Bochum, Lehrstuhl Werkstoffe Elektrotech, D-44780 Bochum, Germany
关键词
D O I
10.1103/PhysRevB.62.15879
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
InAs islands were embedded in the channel of an n-doped GaAs/AlGaAs high electron mobility transistor structure and a 60 x 100 nm(2) constriction was defined by lithography based on the atomic-forte microscope and subsequent wet chemical etching. Compared to an unpatterned device a strong shift of the threshold voltage to higher gate voltages and well-defined peaks were observed at the onset of the conductance. The energetic position as well as the magnetic-field-induced shift of the peaks confirm that electron transport through the p shell of a single InAs quantum dot (QD) is observed. Our experimental data are in excellent agreement with calculations based on a simple parabolic quantum dot potential. A Coulomb blockade energy of approximate to 12 meV is determined for electrons in the first excited QD state.
引用
收藏
页码:15879 / 15887
页数:9
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