Electrical and mechanical properties of surfactant-templated mesoporous silica thin films using Brij-76 surfactant

被引:21
作者
Jung, SB [1 ]
Han, CK [1 ]
Park, HH [1 ]
机构
[1] Yonsei Univ, Dept Ceram Engn, Seokaemun Ku, Seoul 120749, South Korea
关键词
low-k; ordered; mesoporous silica films; Brij-76; surfactant;
D O I
10.1016/j.apsusc.2004.09.127
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ordered mesoporous silica films using Brij-76 surfactant were prepared from self-assembly of organic-inorganic species and their electrical/mechanical properties were investigated for low-k application. X-ray diffraction pattern revealed highly textured pore structure. Adequate dielectric properties could be realized by controlling the chemical species of silica wall. Porosity of mesoporous silica film was 39 +/- 2% and elastic modulus and hardness of the film were 14.4 and 1.25 GPa, respectively. The dielectric constant and leakage current density were measured as 2.55 and less than 2 x 10(-6) A/cm(2) up to 1.6 MV/cm, respectively. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:47 / 50
页数:4
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