Direct observation of large-scale nonuniformities in hydride vapor-phase epitaxy-grown gallium nitride by cathodoluminescence

被引:28
作者
Goldys, EM [1 ]
Paskova, T
Ivanov, IG
Arnaudov, B
Monemar, B
机构
[1] Macquarie Univ, Semicond Sci & Technol Labs, Sydney, NSW 2109, Australia
[2] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
[3] Univ Sofia, Fac Phys, Sofia 1164, Bulgaria
关键词
D O I
10.1063/1.122831
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hydride vapor phase epitaxial GaN films grown on sapphire without a buffer are found to contain large-scale regions with high electron concentration located close to the interface. These regions are composed of individual columns forming an irregular but quasicontinuous layer, while the rest of the film has a much lower carrier concentration. The highly doped regions are easily visualized using cathodoluminescence. The coexistence of regions with low and high electron concentration allows us to explain the concurrent evidence of high film quality in photoluminescence, Raman spectroscopy and x-ray diffraction, and a high electron concentration measured in transport studies. (C) 1998 American Institute of Physics. [S0003-6951(98)03850-9].
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页码:3583 / 3585
页数:3
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