Modulated-temperature DSC (MT-DSC): A new technique for the extensive thermal characterization of complex chemically amplified systems

被引:11
作者
Paniez, PJ
Brun, S
Derrough, S
机构
来源
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV | 1997年 / 3049卷
关键词
chemically amplified systems; thermal characterization; modulated temperature DSC; glass transition temperature; Tg;
D O I
10.1117/12.275816
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two main parameters are expected from the thermal analysis of chemically amplified resist systems, namely the glass transition temperature and the temperature of deprotection. Due to the large heat flow involved in the deprotection reaction, this thermal event is generally easily monitored using conventional Differential Scanning Calorimetry (DSC). Conversely, the glass transition signal, corresponding to slight changes in the heat capacity of the resist material, is often hidden by or convoluted with the deprotection reaction. This problem constitutes a limitation on the understanding and modeling of these resist systems. The recently introduced Modulated Temperature DSC (MT-DSC) technique allows the separation of Tg and the deprotection reaction signals, and therefore provides experimental solutions to unsolved basic questions for each step of the lithographic process. This study presents the first results on the thermal characterization of chemically amplified systems using MT-DSC. All chemically amplified systems, both positive or negative tone, presenting or not a Tg signal convoluted with the deprotection signal, can be completely characterized using this technique.
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页码:168 / 177
页数:10
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