Electrical characteristics of magnesium-doped gallium nitride junction diodes

被引:97
作者
Fedison, JB [1 ]
Chow, TP
Lu, H
Bhat, IB
机构
[1] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Elect Comp & Syst Engn Dept, Troy, NY 12180 USA
关键词
D O I
10.1063/1.121475
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electrical characteristics of lateral p(+)n diodes made from gallium nitride epitaxial layers on sapphire substrates are reported. The current-voltage characteristics are observed to have several distinct regions in which a tunneling current has been identified at low forward bias in addition to the conventional temperature-dependent diffusion current observed at moderate forward bias. A tunneling behavior indicates the presence of deep-level traps at the junction, which alter the electrical behavior of these junctions compared to the conventional behavior. In addition, space-charge-limited currents are found to influence these junctions at large forward and reverse bias. (C) 1998 American Institute of Physics.
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页码:2841 / 2843
页数:3
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