机构:
Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USAUniv Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
Chen, Xiaobo
[1
]
Shen, Shaohua
论文数: 0引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
Xi An Jiao Tong Univ, State Key Lab Multiphase Flow Power Engn, Xian 710049, Shaanxi, Peoples R ChinaUniv Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
Shen, Shaohua
[1
,2
]
Guo, Liejin
论文数: 0引用数: 0
h-index: 0
机构:
Xi An Jiao Tong Univ, State Key Lab Multiphase Flow Power Engn, Xian 710049, Shaanxi, Peoples R ChinaUniv Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
Guo, Liejin
[2
]
Mao, Samuel S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USAUniv Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
Mao, Samuel S.
[1
]
机构:
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[2] Xi An Jiao Tong Univ, State Key Lab Multiphase Flow Power Engn, Xian 710049, Shaanxi, Peoples R China
A significant process has been achieved on semiconductor-based photocatalytic hydrogen generation through water splitting. The processes in the photocatalytic generation of hydrogen include light absorption of the semiconductor photocatalyst, generation of excited charges (electrons and holes), recombination of the excited charges, separation of excited charges, migration of the charges, trap of excited charges, and transfer of excited charges to water or other molecules. The total amount of hydrogen generated is mainly determined by the amount of excited electrons in the water/photocatalyst interface in reducing water. The reaction of photogenerated H2and O2 to form H2O on the photocatalyst surface is normally called 'surface backreaction (SBR)'. The separation of the photoactive sites necessary for hydrogen and oxygen evolution, and which is always accompanied by the surface separation of the photogenerated electrons and holes, has been shown to be greatly affected by the surface properties of the photocatalysts.
机构:
Natl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Abe, R
Sayama, K
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Sayama, K
Arakawa, H
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, Japan
机构:
Natl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Abe, R
Sayama, K
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, Japan
Sayama, K
Arakawa, H
论文数: 0引用数: 0
h-index: 0
机构:
Natl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, JapanNatl Inst Adv Ind Sci & Technol, Photoreact Control Res Ctr, Tsukuba, Ibaraki 3058565, Japan