Fine pattern transfer by nanocasting lithography

被引：19

作者：

Hirai, Y ^{[1
]}

Yoshikawa, T ^{[1
]}

Morimatsu, M ^{[1
]}

Nakajima, M ^{[1
]}

Kawata, H ^{[1
]}

机构：

[1] Osaka Prefecture Univ, Sakai, Osaka 5998531, Japan

来源：

MICROELECTRONIC ENGINEERING | 2005年 / 78-79卷

关键词：

nanoimprint; casting; lithography; polymer; adhesion; resin;

D O I：

10.1016/j.mee.2004.12.080

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel pattern transfer technique has been demonstrated by simple procedure based on a nanoimprint lithography. A polymer is coated on a mold by a spin coater and cast into fine grooves on the mold. After evaporation of a solvent, an adhesive resin is coated on the polymer and put a substrate plate. After releasing the mold, fine pattern is successfully transferred to the polymer. Applying this process, fine pattern transfer using various polymers, high aspect ratio pattern and sub-100 nm patterns have been demonstrated on various substrates. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：641 / 646

页数：6