Observation of top-site adsorption for Xe on Cu(111)

被引：67

作者：

Seyller, T

Caragiu, M

Diehl, RD

Kaukasoina, P

Lindroos, M

机构：

[1] Penn State Univ, Dept Phys, University Pk, PA 16802 USA

[2] Tampere Univ Technol, Dept Phys, FIN-33101 Tampere, Finland

来源：

CHEMICAL PHYSICS LETTERS | 1998年 / 291卷 / 5-6期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/S0009-2614(98)00622-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A low-energy electron diffraction study of Cu(111)-(root 3 x root 3)R30 degrees-Xe at 50 K indicates that Xe atoms occupy the top sites. The equilibrium Xe-Cu interlayer spacing is 3.60 +/- 0.08 Angstrom and the spacings of the three top Cu layers are essentially bulk-like. The Xe-Cu spacing agrees well with estimates based on hard-sphere packing. Top-site adsorption for Xe on Cu(111) was unexpected on the basis of previous experimental and theoretical results for noble gas adsorption on metal surfaces. This result is discussed in the light of earlier studies of physisorbed atoms, anticorrugated potentials in He-atom scattering, and possible links to alkali metal adsorption. (C) 1998 Published by Elsevier Science B.V. All rights reserved.

引用

页码：567 / 572

页数：6

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