Low temperature quartz-to-silicon bonding for SAW applications

被引:2
作者
Berthold, A [1 ]
Sarro, PM [1 ]
Vellekoop, MJ [1 ]
机构
[1] Delft Univ Technol, DIMES, Elect Instrumentat Lab, NL-2600 GA Delft, Netherlands
来源
SMART STRUCTURES AND MATERIALS 1998: SMART ELECTRONICS AND MEMS | 1998年 / 3328卷
关键词
micro acoustic wave detector; quartz-to-silicon bonding; low temperature bonding;
D O I
10.1117/12.320200
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new process for the fabrication of piezoelectric quartz thin films on silicon is investigated. With this process, new silicon-implemented acoustic wave delay lines for sensor applications can be realized. An acoustic-wave delay-line consists of two interdigital thin film metal transducers (IDTs) fabricated on a piezoelectric crystal. In order to realize acoustic-wave devices on (nonpiezoelectric) silicon, the use of piezoelectric thin films such as zinc oxide, aluminum nitride or PZT has been reported. However, these films often exhibit stress, aging, pinholes, or poor reproducibility which affects the performance of the device. The bonding of piezoelectric quartz (with its known and fixed mechanical and piezoelectric properties) to silicon improves the performance of silicon-implemented acoustic-wave devices. The process used, consists of a wet chemical treatment after which the wafers are prebonded at room temperature. Annealing at 140 degrees C for 3 hours yields a sufficient high bond strength.
引用
收藏
页码:81 / 85
页数:5
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