Construction of persistent phenoxyl radical with intramolecular hydrogen bonding

被引：103

作者：

Maki, T ^{[1
]}

Araki, Y ^{[1
]}

Ishida, Y ^{[1
]}

Onomura, O ^{[1
]}

Matsumura, Y ^{[1
]}

机构：

[1] Nagasaki Univ, Fac Pharmaceut Sci, Nagasaki 8528521, Japan

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2001年 / 123卷 / 14期

关键词：

D O I：

10.1021/ja002453+

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：3371 / 3372

页数：2

共 33 条

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