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Properties of arsenic-doped p-type ZnO grown by hybrid beam deposition
被引:486
作者:
Ryu, YR
Lee, TS
White, HW
机构:
[1] MOXtron Inc, Columbia, MO 65203 USA
[2] Univ Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
关键词:
D O I:
10.1063/1.1590423
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
As-doped ZnO (ZnO:As) films have been characterized. ZnO:As films show p-type characteristics determined by Hall-effect and photoluminescence (PL) measurements. The hole concentration can be increased up to the mid-10(17)-cm(-3) range. The thermal binding energy of the As acceptor (E-A(th-b)) is 120+/-610 meV, as derived from temperature-dependent Hall-effect measurements. The PL spectra reveal two different acceptor levels (E-A(opt-b)), located at 115 and 164 meV, respectively, above the maximum of the ZnO valence band, and also show the binding energy of the exciton to the As-acceptor (E-AX(b)) is about 12 meV. The values of the ratio E-AX(b)/(E-A(th-b) or E-A(opt-b)) are located in the range from 0.07 to 0.11. (C) 2003 American Institute of Physics.
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页码:87 / 89
页数:3
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