Deposition of (Zn,Mn)2SiO4 for plasma display panels using charged liquid cluster beam

被引：71

作者：

Cich, M

Kim, K

Choi, H

Hwang, ST

机构：

[1] Univ Illinois, Dept Elect & Comp Engn, Thin Film & Charged Particle Res Lab, Urbana, IL 61801 USA

[2] Univ Illinois, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA

[3] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

来源：

APPLIED PHYSICS LETTERS | 1998年 / 73卷 / 15期

关键词：

D O I：

10.1063/1.122396

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Films of manganese doped zinc silicate have been deposited using the charged liquid cluster beam technique. The deposition conditions were found to have a large impact on the morphology and photoluminescence intensity of these films. The photoluminescence intensity was maximized at a manganese content near delta=0.04 in (Zn1-deltaMndelta)(2)SiO4. No phases other than zinc silicate were detectable with manganese contents up to delta=0.08. (C) 1998 American Institute of Physics. [S0003-6951(98)00641-X].

引用

页码：2116 / 2118

页数：3

共 5 条

[1] MN-2+ CONCENTRATION-EFFECT ON THE OPTICAL-PROPERTIES OF ZN2SIO4MN PHOSPHORS [J].