A study of electron field emission as a function of film thickness from amorphous carbon films

被引：100

作者：

Forrest, RD

Burden, AP

Silva, SRP ^{[1
]}

Cheah, LK

Shi, X

机构：

[1] Univ Surrey, Sch Elect Engn Informat Technol & Math, Guildford GU2 5XH, Surrey, England

[2] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 2263, Singapore

来源：

APPLIED PHYSICS LETTERS | 1998年 / 73卷 / 25期

关键词：

D O I：

10.1063/1.122894

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The electron field-emission properties of hydrogenated amorphous carbon and nitrogenated tetrahedral amorphous carbon thin films are examined by measuring the field-emission current as a function of the applied macroscopic electric field. The experimental results indicate the existence of an optimum film thickness for low-threshold electron field emission. The predictions of various emission models are compared to the experimental results. (C) 1998 American Institute of Physics. [S0003-6951(98)03351-8].

引用

页码：3784 / 3786

页数：3

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