Diffusion-limited growth of FTO-nanofilm-coated tin fractals

被引：5

作者：

Bera, D ^{[1
]}

Patil, S

Scammon, K

Seal, S

机构：

[1] Univ Cent Florida, Surface Engn & Nanotechnol Facil, Adv Mat Proc & Anal Ctr, Orlando, FL 32816 USA

[2] Univ Cent Florida, Mat Characterizat Facil, Adv Mat Proc & Anal Ctr, Orlando, FL 32816 USA

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2005年 / 8卷 / 10期

关键词：

D O I：

10.1149/1.2035693

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Highly porous, geometrical complex fractals of 3 nm thick fluorinated tin oxide (FTO) coated tin have been synthesized during a simple anodization. The dimensionality of fractals is 2.95. Quantitative analysis of the FTO nanofilm shows the fluorine content in the FTO film to be as high as 25 atom %. The mechanism of preferential growth of the tin fractals under the influence of the applied electric field during the anodization was explained using a diffusion-limited aggregation (DLA) model. (c) 2005 The Electrochemical Society.

引用

页码：D31 / D34

页数：4

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