Experimental evidence of inelastic tunneling and new I-V model for stress-induced leakage current

被引:71
作者
Takagi, S
Yasuda, N
Toriumi, A
机构
来源
IEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996 | 1996年
关键词
D O I
10.1109/IEDM.1996.553594
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, we propose a new experimental technique to study the transport properties of stress-induced leakage current (SILC), where the energy of electrons in SILC can be evaluated directly, utilizing the carrier separation measurement. It is found that electrons in SILC lose the energy by around 1.5 eV during tunneling through gate oxides. It is demonstrated that a new carrier transport model including the large energy relaxation describes the experimental I-V characteristics of SILC successfully.
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收藏
页码:323 / 326
页数:4
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