Electrodeposition of epitaxial Cu(111) thin films on Au(111) using defect-mediated growth

被引：38

作者：

Hwang, S ^{[1
]}

Oh, I ^{[1
]}

Kwak, J ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Chem, Yusong Gu, Taejon 305701, South Korea

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2001年 / 123卷 / 29期

关键词：

D O I：

10.1021/ja015666n

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

No abstract available

引用

页码：7176 / 7177

页数：2

共 19 条

[1] UNDERPOTENTIAL DEPOSITION OF LEAD ON COPPER(111) - A STUDY USING A SINGLE-CRYSTAL ROTATING-RING ELECTRODE AND EX-SITU LOW-ENERGY-ELECTRON DIFFRACTION AND AUGER-ELECTRON SPECTROSCOPY [J].

BRISARD, GM ;

ZENATI, E ;

GASTEIGER, HA ;

MARKOVIC, NM ;

ROSS, PN .

LANGMUIR, 1995, 11 (06) :2221-2230

[2] Atomistic mechanism of surfactant-assisted epitaxial growth [J].

Camarero, J ;

Ferron, J ;

Cros, V ;

Gomez, L ;

de Parga, ALV ;

Gallego, JM ;

Prieto, JE ;

de Miguel, JJ ;

Miranda, R .

PHYSICAL REVIEW LETTERS, 1998, 81 (04) :850-853

[3] IN-SITU ATOMIC-FORCE MICROSCOPE STUDY OF PB UNDERPOTENTIAL DEPOSITION ON AU(111) - STRUCTURAL-PROPERTIES OF THE CATALYTICALLY ACTIVE PHASE [J].

CHEN, CH ;

WASHBURN, N ;

GEWIRTH, AA .

JOURNAL OF PHYSICAL CHEMISTRY, 1993, 97 (38) :9754-9760

[4] Properties of an electrochemically deposited Pb monolayer on Cu(111) [J].

Chu, YS ;

Robinson, IK ;

Gewirth, AA .

PHYSICAL REVIEW B, 1997, 55 (12) :7945-7954

[5] COPPER DEPOSITION ONTO AU(III) IN THE PRESENCE OF THIOUREA [J].

HOLZLE, MH ;

APSEL, CW ;

WILL, T ;

KOLB, DM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (11) :3741-3749

[6] Scanning tunneling microscopy studies of metal on metal epitaxy [J].

Hwang, RQ ;

Bartelt, MC .

CHEMICAL REVIEWS, 1997, 97 (04) :1063-1082

[7] Surface morphology and electric conductivity of epitaxial Cu(100) films grown on H-terminated Si(100) [J].

Krastev, ET ;

Voice, LD ;

Tobin, RG .

JOURNAL OF APPLIED PHYSICS, 1996, 79 (09) :6865-6871

[8]

MURARKA SP, 1997, METALLIZATION THEORY

[9]

NEAMEN DA, 1996, SEMICONDUCTOR PHYSIC

[10] ADDITIVES IN THE ELECTROCRYSTALLIZATION PROCESS [J].

PLIETH, W .

ELECTROCHIMICA ACTA, 1992, 37 (12) :2115-2121

← 1 2 →