Accelerated mound decay at adjacent kinks on Cu(111)

被引:10
作者
Feibelman, PJ [1 ]
机构
[1] Sandia Natl Labs, Albuquerque, NM 87185 USA
关键词
surface diffusion; growth; density functional calculations; copper; vicinal single crystal surfaces;
D O I
10.1016/S0039-6028(01)00963-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ab initio barriers to concerted downward transport of Cu atoms range from 0.66 to 0.85 eV, when kinks on adjacent Cu(111) terraces are close. The lowest of these permits mound decay to proceed much faster, at 300-340 K, than when terraces are farther apart, and decay is limited by formation of Cu adatoms and their passage over an island-edge "Schwoebel barrier." (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:L349 / L354
页数:6
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