Unusual scaling for pulsed laser deposition

被引：40

作者：

Hinnemann, B ^{[1
]}

Hinrichsen, H

Wolf, DE

机构：

[1] Univ Duisburg Gesamthsch, Fachbereich 10, D-47048 Duisburg, Germany

[2] Berg Univ Gesamthsch Wuppertal, Fachbereich 8, D-42097 Wuppertal, Germany

来源：

PHYSICAL REVIEW LETTERS | 2001年 / 87卷 / 13期

关键词：

D O I：

10.1103/PhysRevLett.87.135701

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We show that a simple model for pulsed laser deposition exhibits an unusual type of scaling behavior for the island density in the submonolayer regime. This quantity is studied as a function of pulse intensity and deposition time. We find a data collapse for the ratios of the logarithms of these quantities, whereas conventional scaling as observed in molecular beam epitaxy involves ratios of powers.

引用

页码：1 / 135701

页数：4

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