Effect of stress on dopant and defect diffusion in Si: A general treatment

被引：44

作者：

Daw, MS ^{[1
]}

Windl, W

Carlson, NN

Laudon, M

Masquelier, MP

机构：

[1] Motorola Inc, Digital DNA Labs, Computat Mat Grp, Austin, TX 78721 USA

[2] Motorola Inc, Computat Mat Grp, Los Alamos, NM 87545 USA

来源：

PHYSICAL REVIEW B | 2001年 / 64卷 / 04期

关键词：

D O I：

10.1103/PhysRevB.64.045205

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

We present a theoretical treatment of the effect of stress on dopant and defect diffusion in Si. A prior treatment [P. H. Dederichs and K. Schroeder, Phys. Rev. B 17, 2524 (1978)] of vacancy diffusion in strained fcc metals is extended to include more general defects and crystallinity. The new method is applied to two examples in Si: (1) a vacancy, including Jahn-Teller distortions, and (2) a B-I pair. Both are predicted to show isotropic diffusion for (100) grown uniaxially strained film, but strong anisotropic diffusion for (111) films.

引用

页数：10

共 21 条

[1]

Vacancy in silicon revisited: Structure and pressure effects [J].

Antonelli, A ;

Kaxiras, E ;

Chadi, DJ .

PHYSICAL REVIEW LETTERS, 1998, 81 (10) :2088-2091

[2]

PRESSURE EFFECTS ON SELF-DIFFUSION IN SILICON [J].

ANTONELLI, A ;

BERNHOLC, J .

PHYSICAL REVIEW B, 1989, 40 (15) :10643-10646

[3]

Thermodynamics of diffusion under pressure and stress: Relation to point defect mechanisms [J].

Aziz, MJ .

APPLIED PHYSICS LETTERS, 1997, 70 (21) :2810-2812

[4]

Pressure and stress effects on diffusion in Si [J].

Aziz, MJ .

DEFECT AND DIFFUSION FORUM, 1998, 153 :1-10

[5]

BOGY DB, 1968, J APPL MECH, P460

[6]

BORN M, 1988, DYNAMICAL THEORY CRY, P129

[7]

The stress assisted evolution of point and extended defects in silicon [J].

Chaudhry, S ;

Law, ME .

JOURNAL OF APPLIED PHYSICS, 1997, 82 (03) :1138-1146

[8]

THE FREE-EDGE STRESS SINGULARITY AT AN INTERFACE BETWEEN BILINEAR MATERIALS [J].

CHUNG, C ;

EISCHEN, JW .

INTERNATIONAL JOURNAL OF SOLIDS AND STRUCTURES, 1991, 28 (01) :105-113

[9]

ANISOTROPIC DIFFUSION IN STRESS FIELDS [J].

DEDERICHS, PH ;

SCHROEDER, K .

PHYSICAL REVIEW B, 1978, 17 (06) :2524-2536

[10]

THE EFFECT OF SELF-STRESS ON DIFFUSION IN SOLIDS [J].

LARCHE, FC ;

CAHN, JW .

ACTA METALLURGICA, 1982, 30 (10) :1835-1845

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