共 23 条
[1]
Allen RA, 2003, AIP CONF PROC, V683, P421, DOI 10.1063/1.1622505
[2]
[Anonymous], 1995, GUID EXPR UNC MEAS
[3]
Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2,
2004, 5375
:133-150
[4]
BANKE B, 1999, SPIE P, V3677, P291
[5]
Preliminary results for mask metrology using spatial heterodyne interferometry
[J].
23RD ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2,
2003, 5256
:1331-1342
[6]
Benchmarking of advanced CD-SEMs at the 130nm CMOS technology node
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2,
2002, 4689
:102-115
[7]
BUNDAY BD, 2003, SPIE P, V5038, P1038
[8]
CD reference materials for sub-tenth micrometer applications
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2,
2002, 4689
:116-127
[9]
CRESSWELL MW, 2005, IN PRESS SPIE P, V5752
[10]
Reference metrology using a next generation CD-AFM
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2,
2004, 5375
:633-646