Surface characterization of ZnO transparent thin films

Zinc oxide transparent thin films (ZnO) with different thickness were prepared by do magnetron sputtering and pulsed laser deposition (PLD) techniques using metallic and ceramic targets onto silicon and Corning glass substrates. Structural investigations carried out by Optical Microscopy (OM), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM) and X-ray Diffraction (XRD) have shown a strong influence of the target and deposition technique on the film surface topography. Film roughness (RMS), grain shape and dimensions were found to correlate with the applied deposition technique. On the films grown by PLD high oriented nanostructures were identified and XRD measurements proved that they have a polycrystalline structure following the characteristic zincite XRD spectrum, while the do magnetron sputtered films were amorphous. Results revealed also that the target composition has a radical effect on film characteristics. In the case of thin films sputtered from a ceramic target AFM analysis has shown the presence of hexagonal shaped grains exhibiting a different surface behavior compared with the films grown from metallic target, the first being also the case of the PLD grown film surfaces. This work indicates that the film surface characteristics are strongly influenced by the deposition technique and conditions applied, thus providing a tool for the enhancement of the film sensing capabilities.