Silicon spin diffusion transistor: materials, physics and device characteristics

被引:5
作者
Dennis, CL
Tiusan, CV
Gregg, JF
Ensell, GJ
Thompson, SM
机构
[1] Univ Oxford, Clarendon Lab, Oxford OX1 3PU, England
[2] Univ H Poincare Nancy 1, Fac Sci, Phys Mat Lab, F-54506 Vandoeuvre Les Nancy, France
[3] Univ Southampton, Dept Elect, Southampton SO17 1BJ, Hants, England
[4] Univ York, Dept Phys, York YO10 5DD, N Yorkshire, England
来源
IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS | 2005年 / 152卷 / 04期
关键词
D O I
10.1049/ip-cds:20050008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The realisatlon that everyday electronics has ignored the spin of the carrier in favour of its charge is the foundation of the field of spintronics. Starting with simple two-terminal devices based on giant magnetoresistance and tunnel magnetoresistance, the technology has advanced to consider three-terminal devices that aim to combine spin sensitivity with a high current gain and a large current output. These devices require both efficient spin injection and semiconductor fabrication. In the paper, a discussion is presented of the design, operation and characteristics of the only spin transistor that has yielded a current gain greater than one in combination with reasonable output currents.
引用
收藏
页码:340 / 354
页数:15
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