Local temperature response to pulsed discharges in electronic discharge machining (EDM) environment

被引:15
作者
Revaz, B [1 ]
Emery, J
Witz, G
Flükiger, R
Perez, R
Carron, J
Rappaz, M
机构
[1] Univ Geneva, Dept Phys, CH-1208 Geneva, Switzerland
[2] Charmilles Technol, CH-1217 Geneva, Switzerland
[3] Ecole Polytech Fed Lausanne, Lab Simulat Mat, CH-1015 Lausanne, Switzerland
关键词
discharges; microsensors; temperature measurement;
D O I
10.1109/TPS.2005.848611
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We report on local temperature measurements performed during single discharges in electronic discharge machining (EDM) environment. Measurements have been performed with two different setups. One being a thermal device consisting of 14 thin film Au-Pd thermocouples. This device with 4-mu m(2) large junctions was patterned using standard photolithography. The distance between the junctions (i.e., the local resolution of the device) is 20 mu m, whereas the sensitivity is 10 mu V/K at 150 degrees C. The other setup being a fast infrared charge-coupled device (CCD) camera with home made control electronics. An acquisition rate of 80 000 PICtures/s with a 10-mu m local resolution was obtained. Using standard electron discharge machining (EDM) equipment, the temperature response due to a single discharge was measured with both the equipment, which show excellent agreement. The maximum temperature measured on the backside of a 20-mu m-thick foil is 590 degrees C. Analysis of the thermovoltage noise pattern allowed precise determination of the beginning and duration of the discharge. The numerical simulation of the process is presented and discussed.
引用
收藏
页码:1066 / 1071
页数:6
相关论文
共 17 条
  • [1] Micro- and nanoelectric-discharge machining
    Beltrami, L
    Joseph, C
    Clavel, R
    Bacher, JP
    Bottinelli, S
    [J]. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2004, 149 (1-3) : 263 - 265
  • [2] CARRON J, MET MAT T
  • [3] Microstructure at submicron scale of the white layer produced by EDM technique
    Cusanelli, G
    Hessler-Wyser, A
    Bobard, F
    Demellayer, R
    Perez, R
    Flükiger, R
    [J]. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2004, 149 (1-3) : 289 - 295
  • [4] EDM simulation: finite element-based calculation of deformation, microstructure and residual stresses
    Das, S
    Klotz, M
    Klocke, F
    [J]. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2003, 142 (02) : 434 - 451
  • [5] Optical emission spectroscopy of electrical discharge machining plasma
    Descoeudres, A
    Hollenstein, C
    Demellayer, R
    Wälder, G
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (06) : 875 - 882
  • [6] THEORETICAL-MODELS OF THE ELECTRICAL-DISCHARGE MACHINING PROCESS .1. A SIMPLE CATHODE EROSION MODEL
    DIBITONTO, DD
    EUBANK, PT
    PATEL, MR
    BARRUFET, MA
    [J]. JOURNAL OF APPLIED PHYSICS, 1989, 66 (09) : 4095 - 4103
  • [7] THEORETICAL-MODELS OF THE ELECTRICAL-DISCHARGE MACHINING PROCESS .3. THE VARIABLE MASS, CYLINDRICAL PLASMA MODEL
    EUBANK, PT
    PATEL, MR
    BARRUFET, MA
    BOZKURT, B
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 73 (11) : 7900 - 7909
  • [8] PLASMA CHANNEL GROWTH AND THE RESOLIDIFIED LAYER IN EDM
    PANDEY, PC
    JILANI, ST
    [J]. PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING, 1986, 8 (02): : 104 - 110
  • [9] THEORETICAL-MODELS OF THE ELECTRICAL-DISCHARGE MACHINING PROCESS .2. THE ANODE EROSION MODEL
    PATEL, MR
    BARRUFET, MA
    EUBANK, PT
    DIBITONTO, DD
    [J]. JOURNAL OF APPLIED PHYSICS, 1989, 66 (09) : 4104 - 4111
  • [10] Theoretical modeling of energy balance in electroerosion
    Perez, P
    Rojas, H
    Walder, G
    Flükiger, R
    [J]. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2004, 149 (1-3) : 198 - 203