Studies of 2.45 GHz microwave induced plasma abatement of CF4

被引：23

作者：

Radoiu, MT ^{[1
]}

机构：

[1] BOC Edwards, Exhaust Gas Management, Clevedon BS21 6TH, England

来源：

ENVIRONMENTAL SCIENCE & TECHNOLOGY | 2003年 / 37卷 / 17期

关键词：

D O I：

10.1021/es0263846

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

Microwave plasmas at 2.45 GHz frequency operated at atmospheric pressure in synthetic gas mixtures containing N-2 and CF4 are investigated experimentally for various operating conditions, with respect to their ability to destroy perfluorocompounds. It was found that the destruction and removal efficiency of the process is highly dependent on the total gas flow and concentration of CF4. Destruction and removal efficiencies of CF4 up to 98% have been achieved using 1.9 kW of microwave power at 16 L/min total flow rate.

引用

页码：3985 / 3988

页数：4

共 31 条

[1]

Allgood CC, 1998, ADV MATER, V10, P1239, DOI 10.1002/(SICI)1521-4095(199810)10:15<1239::AID-ADMA1239>3.0.CO

[2]

2-9

[3]

BAYLISS KH, 1995, Patent No. 5418430

[4] Introduction to gas discharges [J].

Braithwaite, NSJ .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (04) :517-527

[5]

Brown RS, 2001, SOLID STATE TECHNOL, V44, P189

[6]

BROWN RS, 2001, SEMICONDUCTOR INT, V24, P209

[7] An atmospheric-pressure plasma process for C2F6 removal [J].

Chang, MB ;

Yu, SJ .

ENVIRONMENTAL SCIENCE & TECHNOLOGY, 2001, 35 (08) :1587-1592

[8] The evaluation of hexafluorobenzene as an environmentally benign dielectric etch chemistry [J].

Chatterjee, R ;

Karecki, S ;

Reif, R ;

Sparks, T ;

Vartanian, V ;

Goolsby, B .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (12) :G721-G724

[9]

Chen X, 2000, P 13 INT TECH M SAT, P9

[10] Plasma generation and plasma sources [J].

Conrads, H ;

Schmidt, M .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 2000, 9 (04) :441-454

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