SiC coatings for mirrors prepared by low pressure chemical vapor deposition

被引：20

作者：

Liu, RJ ^{[1
]}

Zhang, CR ^{[1
]}

Zhou, XG ^{[1
]}

Cao, YB ^{[1
]}

机构：

[1] Natl Univ Def Technol, Key Lab Adv Fibers & Composites, Coll Aerosp & Mat Engn, Changsha 410073, Peoples R China

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 2003年 / 22卷 / 11期

关键词：

D O I：

10.1023/A:1023924528444

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The deposition of dense silicon carbide (SiC) coatings for mirrors by low pressure chemical vapor deposition was investigated. It was observed that the deposition rate of SiC increased with the temperature, and the curve was divided into two parts of different slopes with a transition point at 1150 °C. The results of activation energy, scanning electron microscopy images and x-ray diffraction patterns showed that 1150 °C was the transitional point for chemical vapor deposition SiC.

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页码：841 / 843

页数：3

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