Ion beam formation in the field of double layer stabilized by spatial reversal of magnetic field

The ion beam generation and dynamics of processes in a pulsed straight high-current gas discharge at low pressures have been studied. The spatial reversal of a longitudinal confining magnetic field is used to stabilize a potential jump. The potential difference of 3-10 kV is applied to the discharge gap filled with a preliminary created plasma. Initially, the precathode potential jump is formed and, thereafter, the quasi-steady double layer arises in the region of magnetic field reversal. Potential difference is concentrated in the double layer, where formation of ion and electron beams occur. A current value of the ion beam formed in the double layer is determined by Bohm's current of the plasma in the anode part of discharge gap (j< 0.6A/cm(2)). The ion beam energy is determined by a value of the potential jump (3-10 kV) in the double layer. When the plasma with the density higher than the critical one is formed in the system, the magnetic field reversal is self-consistently suppressed; the double layer is destroyed and ion beam generation ceases.