A simple method for fabrication of mesoporous films using a rapid heating process

被引：5

作者：

Yamada, T

Zhou, HS ^{[1
]}

Honma, I

Ueno, Y

Horiuchi, T

Niwa, O

机构：

[1] Natl Inst Adv Ind Sci & Technol, AIST, Energy Elect Inst, Tsukuba, Ibaraki 3058568, Japan

[2] PRESTO, Japan Sci & Technol Agcy, JST, Kawaguchi 3320012, Japan

[3] NTT Corp, Microsyst Integrat labs, Atsugi, Kanagawa 2430198, Japan

来源：

CHEMISTRY LETTERS | 2005年 / 34卷 / 03期

关键词：

D O I：

10.1246/cl.2005.328

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.

引用

收藏

页码：328 / 329

页数：2

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