Novel properties of ultrathin oxide films: NiO supported on Al2O3

被引：7

作者：

Xu, C

Guo, Q

Goodman, DW

机构：

[1] Department of Chemistry, Texas A and M University, College Station

来源：

CATALYSIS LETTERS | 1996年 / 41卷 / 1-2期

关键词：

carbon monoxide; nickel oxide; alumina; mixed oxide; electron energy loss spectroscopy (ELS); temperature programmed desorption (TPD); infrared reflection adsorption spectroscopy (IRAS);

D O I：

10.1007/BF00811707

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ultrathin NiO films have been prepared on an Al2O3(0001) surface, supported on a Mo(110) or Re(0001) substrate. The electronic and chemical properties of these NiO films have been studied using electron energy loss spectroscopy (ELS), temperature programmed desorption (TPD), and infrared reflection adsorption spectroscopy (IRAS). TPD and IRAS of adsorbed CO show that the chemical properties of the thin (< 10 monolayers) NiO films are considerably different from those of thick (> 10 monolayers) NiO films. The electronic structure, however, for NiO films with thicknesses between 0.5 and 28 ML are indistinguishable by ELS. Heating monolayer NiO on Al2O3 to 800 K in vacuum leads to a substantial reduction of NiO to metallic Ni.

引用

页码：21 / 25

页数：5

共 34 条

[1] THE STRUCTURE OF THIN NIO(100) FILMS GROWN ON NI(100) AS DETERMINED BY LOW-ENERGY-ELECTRON DIFFRACTION AND SCANNING TUNNELING MICROSCOPY [J].