Synthesis of well-ordered ultra-thin titanium oxide films on Mo(112)

被引：46

作者：

Chen, MS ^{[1
]}

Wallace, WT ^{[1
]}

Kumar, D ^{[1
]}

Yan, Z ^{[1
]}

Gath, KK ^{[1
]}

Cai, Y ^{[1
]}

Kuroda, Y ^{[1
]}

Goodman, DW ^{[1
]}

机构：

[1] Texas A&M Univ, Dept Chem, College Stn, TX 77842 USA

来源：

SURFACE SCIENCE | 2005年 / 581卷 / 2-3期

关键词：

high-resolution electron energy loss spectroscopy (HREELS); scanning tunneling microscopy (STM); X-ray photoelectron spectroscopy (XPS); titanium oxide; surface structure; morphology; roughness; and topography; thin film;

D O I：

10.1016/j.susc.2005.02.039

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Well-ordered Mo(112)-(8 x 2)-TiOx films were grown on the Mo(112) surface. Two preparation methods, direct growth on the Mo(112) surface and indirect growth by deposition of Ti onto monolayer SiO2/MO(112), were used. The latter method was found to be more reproducible with respect to film quality as determined by low-energy electron diffraction and scanning tunneling microscopy. The well-ordered (8 x 2)-TiOx film, for which a structure is proposed, was determined to be 1 ML and the Ti to be in an oxidation state of +3 using Auger spectroscopy, high-resolution electron energy loss spectroscopy and X-ray photoelectron spectroscopy. (c) 2005 Published by Elsevier B.V.

引用

页码：L115 / L121

页数：7

共 37 条

[1] Thin film TiO2 on nickel(110):: an STM study [J].