Analysis of surface forces on oxides in aqueous solutions using AFM

被引:37
作者
Arai, T
Aoki, D
Okabe, Y
Fujihira, M
机构
[1] Dept. of Biomolecular Engineering, Tokyo Institute of Technology, Yokohama 226, 4259 Nagatsuta, Midori-ku
关键词
atomic force microscopy; silicon; surface and interface states;
D O I
10.1016/0040-6090(95)07005-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The surface forces between a Si3N4 tip and sample surfaces of various oxides, such as SiO2, SnO2, and Al2O3 were measured in electrolytes with various pH values using atomic force microscopy. The isoelectric points were estimated from the force-distance curves. A similar treatment was applied to hydrocarbon-modified quartz surfaces. Almost no effect of the surface modification was found in neutral solutions, while a small difference in the force-distance curves before and after the modification was observed in acidic and alkaline solutions. The electric double layer force due to the concentration profile of the counterions at the oxide/water interface is discussed in terms of acid-base reactions of -OH groups on the oxide surface.
引用
收藏
页码:322 / 326
页数:5
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