Kondo effect in electromigrated gold break junctions

被引:124
作者
Houck, AA
Labaziewicz, J
Chan, EK
Folk, JA [1 ]
Chuang, IL
机构
[1] MIT, Ctr Bits & Atoms, Cambridge, MA 02139 USA
[2] MIT, Dept Phys, Cambridge, MA 02139 USA
[3] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
关键词
D O I
10.1021/nl050799i
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We present gate-dependent transport measurements of Kondo impurities in bare gold break junctions, generated with high yield using an electromigration process that is actively controlled. Thirty percent of measured devices show zero-bias conductance peaks. Temperature dependence suggests Kondo temperatures similar to 7 K. The peak splitting in magnetic field is consistent with theoretical predictions for g = 2, though in many devices the splitting is offset from 2g mu(B)B by a fixed energy. The Kondo resonances observed here may be due to atomicscale metallic grains formed during electromigration.
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页码:1685 / 1688
页数:4
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