Thermal noise modeling for short-channel MOSFET's

被引:95
作者
Triantis, DP
Birbas, AN
Kondis, D
机构
[1] Univ of Patras, Patras
关键词
D O I
10.1109/16.543032
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An analytical formulation of the thermal noise in short-channel MOSFET's, working in the saturation region, is presented, For the noise calculation, we took into account effects like the held dependent noise temperature and mobility, the device geometry and the channel length modulation, the back gate effect and the velocity saturation, The derived data from the model are in good agreement with reported thermal noise measurements, regarding the noise bias dependence, for transistors with channel lengths shorter than 1 mu m. Since the present thermal noise models of MOS transistors are valid for channel lengths well above 1 mu m, the proposed model can be easily incorporated in circuit simulators like SPICE, providing an extension to the analytical thermal noise modeling suitable for submicron MOSFET's.
引用
收藏
页码:1950 / 1955
页数:6
相关论文
共 10 条
[1]  
ABIDI A, 1986, IEEE T ELECT DEVICES, V33
[2]  
BAREIKIS V, 1994, IEEE T ELECT DEVICES, V41
[3]  
ELMANSY Y, 1977, IEEE T ELECT DEVICES, V24
[4]  
GASQUET D, 1995, 2 ELEN WORKSH GREN F
[5]  
JINDAL RP, 1986, IEEE T ELECT DEVICES, V33
[6]  
TAKEUCHI K, 1994, IEEE T ELECT DEVICES, V41
[7]  
TEDJA S, 1994, IEEE T ELECT DEVICES, V41
[8]  
TOH KY, 1988, IEEE J SOLID STATE C, V23
[9]  
Van der Ziel A, 1986, NOISE SOLID STATE DE, P69
[10]  
WANG B, 1994, IEEE J SOLID STATE C, V29