Electrodeposition of thin gold films from an aminosilicate stabilized gold sol

被引：20

作者：

Bharathi, S ^{[1
]}

Joseph, J ^{[1
]}

Lev, O ^{[1
]}

Lev, Z ^{[1
]}

机构：

[1] Hebrew Univ Jerusalem, Fredy & Nadine Herrmann Sch Appl Sci, IL-91904 Jerusalem, Israel

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 1999年 / 2卷 / 06期

关键词：

D O I：

10.1149/1.1390812

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Anodic deposition of thin films (up to 0.5 mu m thick) of gold nanodispersion from aminosilicate stabilized gold sols is demonstrated for indium-tin oxide and platinum substrates. The films are conductive, semitransparent, and comprised of 4-6 nm gold particles each coated by a thin aminosilicate shell. Anodic deposition of stabilized gold nanoparticles is a new way to produce modified electrodes comprised of silicate-noble metal composite coatings with a high degree of interconnectivity between the gold grains. (C) 1999 The Electrochemical Society. S1099-0062(98)10-072-X. All rights reserved.

引用

页码：284 / 287

页数：4

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