Laser-induced microstructuring of photonic materials: Semiconductors

被引:3
作者
Dubowski, JJ [1 ]
机构
[1] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
来源
1ST INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2000年 / 4088卷
关键词
laser microstructuring; pulsed laser deposition; dry etching; annealing; intermixing; quantum well and dot microstructures; photonic integrated circuits;
D O I
10.1117/12.405689
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The laser has become an increasingly important tool, which helps to overcome the limitations of conventional microfabrication technologies, delivering devices capable of performing new and increased numbers of operations within an ever shrinking physical volume. In addition to "classical" applications of lasers such as via hole drilling, trimming or pulsed laser deposition of thin films, there have been new developments in laser-based technologies for the fabrication of advanced micro- and nano-devices. Of particular interest for optoelectronic and photonic applications is the potential for commercial processing of semiconductors and the fabrication of integrated and monolithically integrated photonic devices and circuits.
引用
收藏
页码:55 / 63
页数:9
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