Sub-10 nm thick microporous membranes made by plasma-defined atomic layer deposition of a bridged silsesquioxane precursor

被引：47

作者：

Jiang, Ying-Bing ^{[1
]}

Xomeritakis, George ^{[2
]}

Chen, Zhu ^{[2
]}

Dunphy, Darren ^{[2
]}

Kissel, David J. ^{[2
]}

Cecchi, Joseph L. ^{[1
,2
]}

Brinkertt, C. Jeffrey ^{[1
,2
]}

机构：

[1] Sandia Natl Labs, Dept 1815, Albuquerque, NM 87185 USA

[2] Univ New Mexico, Dept Chem & Nucl Engn, Albuquerque, NM 87131 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2007年 / 129卷 / 50期

关键词：

D O I：

10.1021/ja0773756

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report atomic layer deposition of an ultrathin hybrid organic/inorganic film on a porous support and its conversion to a high flux, high selectivity membrane. Through chemical passivation of the internal support porosity and remote oxygen plasma activation of the support surface, ALD of a bis(triethoxysilyl)ethane precursor is confined to the immediate surface of the support, allowing formation of a 5 nm thick film spanning the underlying porosity. UV/ozone removal of the C-2 porogen creates a microporous membrane with a He/SF6 selectivity > 10(4) and a substantial He flux of 5.3 sccm/bar.cm(2). Prior to conversion, these ultrathin films are of interest as low k dielectric sealing layers. Use of bridging ligands with other shapes and sizes should enable generalization of this approach to other demanding separation problems.

引用

页码：15446 / +

页数：3

共 15 条

[1] SOL-GEL STRATEGIES FOR CONTROLLED POROSITY INORGANIC MATERIALS [J].

BRINKER, CJ ;

SEHGAL, R ;

HIETALA, SL ;

DESHPANDE, R ;

SMITH, DM ;

LOY, D ;

ASHLEY, CS .

JOURNAL OF MEMBRANE SCIENCE, 1994, 94 :85-102

[2]

Brinker CJ, 1999, ADV MATER, V11, P579, DOI 10.1002/(SICI)1521-4095(199905)11:7<579::AID-ADMA579>3.3.CO

[3]

2-I

[4] Atomic layer deposition of SiO2 and TiO2 in alumina tubular membranes:: Pore reduction and effect of surface species on gas transport [J].

Cameron, MA ;

Gartland, IP ;

Smith, JA ;

Diaz, SF ;

George, SM .

LANGMUIR, 2000, 16 (19) :7435-7444

[5] Chemistry for positive pattern transfer using area-selective atomic layer deposition [J].

Chen, R ;

Bent, SF .

ADVANCED MATERIALS, 2006, 18 (08) :1086-+

[6] A new application of UV-ozone treatment in the preparation of substrate-supported, mesoporous thin films [J].

Clark, T ;

Ruiz, JD ;

Fan, HY ;

Brinker, CJ ;

Swanson, BI ;

Parikh, AN .

CHEMISTRY OF MATERIALS, 2000, 12 (12) :3879-3884

[7] Gas-phase deposition of aminopropylalkoxysilanes on porous silica [J].

Ek, S ;

Iiskola, EI ;

Niinistö, L .

LANGMUIR, 2003, 19 (08) :3461-3471

[8] Dual SAW sensor technique for determining mass and modulus changes [J].

Hietala, SL ;

Hietala, VM ;

Brinker, CJ .

IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, 2001, 48 (01) :262-267

[9] Fast mass transport through sub-2-nanometer carbon nanotubes [J].

Holt, JK ;

Park, HG ;

Wang, YM ;

Stadermann, M ;

Artyukhin, AB ;

Grigoropoulos, CP ;

Noy, A ;

Bakajin, O .

SCIENCE, 2006, 312 (5776) :1034-1037

[10] Nanometer-thick conformal pore sealing of self-assembled mesoporous silica by plasma-assisted atomic layer deposition [J].

Jiang, Ying-Bing ;

Liu, Nanguo ;

Gerung, Henry ;

Cecchi, Joseph L. ;

Brinker, C. Jeffrey .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2006, 128 (34) :11018-11019

← 1 2 →