Formation of Au nanoparticles in silica by post-irradiation and thermal annealing

被引:8
作者
Budak, S. [1 ,2 ]
Guner, S. [1 ,3 ]
Minamisawa, R. Amaral [1 ]
Muntele, C. [1 ]
Ila, D. [1 ]
机构
[1] Alabama A&M Univ, Dept Phys, Ctr Irradiat Mat, Normal, AL 35762 USA
[2] Alabama A&M Univ, Dept Elect Engn, Normal, AL 35762 USA
[3] Fatih Univ, Dept Phys, TR-34500 Istanbul, Turkey
基金
美国国家科学基金会;
关键词
nanocluster; ion bombardment;
D O I
10.1016/j.nimb.2007.12.001
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
SiO2 + Au thin films were prepared on SiO2 substrates using ion beam assisted deposition (IBAD). The film was annealed at different temperatures. After each annealing, the optical absorption spectrum was taken to monitor the gold nanocluster formation in the thin film. By using Doyle's formula, the size of the nanoclusters was determined and plotted as a function of the annealing temperature. Separately, other identical films were bombarded with ions of different energies and different fluence to monitor the nanoclusters forming during the bombardments. We have compared the effect of electronic energy deposition of the energetic ions with the effect of annealing at various temperatures. (C) 2007 Published by Elsevier B.V.
引用
收藏
页码:1574 / 1577
页数:4
相关论文
共 13 条
[1]   Fabrication of ZnO nanoparticles in SiO2 by ion implantation combined with thermal oxidation -: art. no. 013109 [J].
Amekura, H ;
Umeda, N ;
Sakuma, Y ;
Kishimoto, N ;
Buchal, C .
APPLIED PHYSICS LETTERS, 2005, 87 (01)
[2]   NEAR-SURFACE NUCLEATION AND CRYSTALLIZATION OF AN ION-IMPLANTED LITHIA-ALUMINA-SILICA GLASS [J].
ARNOLD, GW .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) :4466-4473
[3]   AGGREGATION AND MIGRATION OF ION-IMPLANTED SILVER IN LITHIA-ALUMINA-SILICA GLASS [J].
ARNOLD, GW ;
BORDERS, JA .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (04) :1488-1496
[4]   ABSORPTION OF LIGHT BY COLLOIDS IN ALKALI HALIDE CRYSTALS [J].
DOYLE, WT .
PHYSICAL REVIEW, 1958, 111 (04) :1067-1072
[5]  
FUKUMI K, 1992, MATER RES SOC SYMP P, V235, P389
[6]  
Ila D, 1997, MATER RES SOC SYMP P, V457, P143
[7]   Nano-cluster engineering: A combined ion implantation/co-deposition and ionizing radiation [J].
Ila, D ;
Zimmerman, RL ;
Muntele, CI ;
Thevenard, P ;
Orucevic, F ;
Santamaria, CL ;
Guichard, PS ;
Schiestel, S ;
Carosella, CA ;
Hubler, GK ;
Poker, DB ;
Hensley, DK .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 191 :416-421
[8]   MODIFICATION OF THE OPTICAL-PROPERTIES OF GLASS BY SEQUENTIAL ION-IMPLANTATION [J].
MAGRUDER, RH ;
ZUHR, RA ;
OSBORNE, DH .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 99 (1-4) :590-593
[10]  
Qian Y, 1996, MATER RES SOC SYMP P, V396, P423