Synthesis of high-density carbon nanotube films by microwave plasma chemical vapor deposition

被引:20
作者
Kim, U [1 ]
Pcionek, R
Aslam, DM
Tománek, D
机构
[1] Michigan State Univ, Dept Elect & Comp Engn, E Lansing, MI 48824 USA
[2] Michigan State Univ, Dept Phys & Astron, E Lansing, MI 48824 USA
基金
美国国家航空航天局;
关键词
carbon nanotube; microwave plasma chemical vapor deposition (MPCVD);
D O I
10.1016/S0925-9635(01)00384-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanotubes with diameters ranging from 20 to 400 nm and densities in the range of 10(8)-10(9) cm(-2), produced on metal-coated silicon by microwave plasma chemical vapor deposition, show various shapes depending upon: (i) growth conditions, and (ii) pre-or post-growth treatment of the samples. Presence of nitrogen in the growth or pre-growth atmosphere increases the density and vertical growth rate of nanotubes. The growth rate on an iron-coated substrate is higher than on a nickel-coated substrate. A cleaning procedure, consisting of ultrasonic treatment of nanotubes in methanol, is demonstrated. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1947 / 1951
页数:5
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