Cathodoluminescence depth analysis in SiO2-Si-systems

被引:10
作者
Goldberg, M [1 ]
Barfels, T [1 ]
Fitting, HJ [1 ]
机构
[1] Univ Rostock, Fachbereich Phys, D-18051 Rostock, Germany
来源
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1998年 / 361卷 / 6-7期
关键词
D O I
10.1007/s002160050947
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
SEM cathodoluminescence (CL) is extended to luminescence center spatial depth profiling by means of electron beam energy E-o variation and consequently variation of CL excitation range. In this way the CL profile of SiO2-layers on Si substrate offers a dead layer of luminescence beneath the surface (10-75) nm as well as the SiO2 oxide thickness with an accuracy of better 10% across a small spot area of less than 1 mu m.
引用
收藏
页码:560 / 561
页数:2
相关论文
共 5 条
[1]   DETERMINATION OF KILOVOLT ELECTRON ENERGY DISSIPATION VS PENETRATION DISTANCE IN SOLID MATERIALS [J].
EVERHART, TE ;
HOFF, PH .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) :5837-&
[2]   ELECTRON PENETRATION AND ENERGY-TRANSFER IN SOLID TARGETS [J].
FITTING, HJ ;
GLAEFEKE, H ;
WILD, W .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 43 (01) :185-190
[3]   Cathodoluminescence and cathodoelectroluminescence of amorphous SiO2 films [J].
Goldberg, M ;
Fitting, HJ ;
Trukhin, A .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1997, 220 (01) :69-77
[4]   PENETRATION AND ENERGY-LOSS THEORY OF ELECTRONS IN SOLID TARGETS [J].
KANAYA, K ;
OKAYAMA, S .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (01) :43-&
[5]   MEASUREMENT OF DIFFUSION LENGTHS IN DIRECT-GAP SEMICONDUCTORS BY ELECTRON-BEAM EXCITATION [J].
WITTRY, DB ;
KYSER, DF .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (01) :375-&