Chemical and structural characterization of La0.5Sr0.5MnO3 thin films prepared by pulsed-laser deposition

被引:26
作者
Decorse, P
Quenneville, E
Poulin, S
Meunier, M
Yelon, A
Morin, F
机构
[1] Ecole Polytech, Grp Couches Minces, Montreal, PQ H3C 3A7, Canada
[2] Ecole Polytech, Dept Engn Phys & Mat Engn, Montreal, PQ H3C 3A7, Canada
[3] Inst Rech Hydro Quebec, Varennes, PQ J3X 1S1, Canada
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2001年 / 19卷 / 03期
关键词
D O I
10.1116/1.1368200
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
La0.5Sr0.5MnO3 thin films were deposited onto sapphire substrates by means of the pulsed-laser deposition technique. These films were characterized by several techniques including x-ray diffraction, Rutherford backscattering spectrometry, energy-dispersive x-ray, atomic-force microscopy, scanning electron microscopy, and x-ray photoelectron spectroscopy (XPS). The cation ratios are the same in the deposited films as in the target. However, strontium segregation occurs at the film surface with an enrichment in this, element compared to Mn and La, as shown by XPS. In addition, a clear correlation between the three different contributions which compose the O(1s) XPS signal and the Sr, La, and Mn surface concentrations has been established. Annealing the films at a sufficiently high-temperature produces the same crystal structure as in the target. (C) 2001 American Vacuum Society.
引用
收藏
页码:910 / 915
页数:6
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