Irradiation-induced defect production in elemental metals and semiconductors: A review of recent molecular dynamics studies

被引:46
作者
delaRubia, TD
机构
来源
ANNUAL REVIEW OF MATERIALS SCIENCE | 1996年 / 26卷
关键词
ion implantation; radiation damage; ion beams; materials modification;
D O I
10.1146/annurev.ms.26.080196.003145
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
fOver the last ten years, molecular dynamics (MD) computer simulation has been used extensively to study defect production mechanisms in irradiated solids. We review the current status of the field and describe the insights that can be gained regarding the form of the primary damage state induced in elemental metals and semiconductors by irradiation. First we point out the features of MD simulations relevant to radiation effect studies. We then describe how melting and resolidification of the cascade core leads to well-separated vacancy and interstitial profiles in metals. In semiconductors, however, the simulations demonstrate how the resolidification process leads to intracascade amorphization and the form of the primary damage state different from that found in metals. We end by discussing the limitations of the method and indicate where other techniques such as kinetic Monte Carlo modeling will be useful in the future.
引用
收藏
页码:613 / 649
页数:37
相关论文
共 100 条
[1]  
ADAMS JB, 1994, FUNDAMENTAL RAD DAMA, P265
[2]  
Allen M.P., 1987, Computer Simulation of Liquids, DOI DOI 10.1093/OSO/9780198803195.001.0001
[3]   ION-IRRADIATION STUDIES OF THE DAMAGE FUNCTION OF COPPER AND SILVER [J].
AVERBACK, RS ;
BENEDEK, R ;
MERKLE, KL .
PHYSICAL REVIEW B, 1978, 18 (08) :4156-4171
[4]   A MODEL FOR SURFACE DAMAGE IN ION-IRRADIATED SOLIDS [J].
AVERBACK, RS ;
GHALY, M .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (06) :3908-3910
[5]  
AVERBACK RS, 1995, MATER RES SOC SYMP P, V373, P3
[6]  
AVERBACK RS, 1994, FUNDAMENTAL RAD DAMA, P49
[7]   COMPUTER-SIMULATION OF DEFECT PRODUCTION BY DISPLACEMENT CASCADES IN METALS [J].
BACON, DJ ;
CALDER, AF ;
GAO, F ;
KAPINOS, VG ;
WOODING, SJ .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 102 (1-4) :37-46
[8]  
BACON DJ, 1994, FUNDAMENTAL RAD DAMA, P275
[9]   CHEMICAL AND PHYSICAL SPUTTERING OF FLUORINATED SILICON [J].
BARONE, ME ;
GRAVES, DB .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (03) :1263-1274
[10]  
BEELER JR, 1988, COMPUTER SIMULATION, P45