Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering

被引：38

作者：

Gallais, Laurent ^{[1
]}

Capoulade, Jeremie ^{[1
]}

Natoli, Jean-Yves ^{[1
]}

Commandre, Mireille ^{[1
]}

Cathelinaud, Michel ^{[1
]}

Koc, Cian ^{[1
]}

Lequime, Michel ^{[1
]}

机构：

[1] Univ Aix Marseille 1, Univ Paul Cezanne, Ecole Cent Marseille, Inst Fresnel,CNRS,UMR 6133, F-13397 Marseille 20, France

来源：

APPLIED OPTICS | 2008年 / 47卷 / 13期

关键词：

D O I：

10.1364/AO.47.00C107

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or HfO2 starting material), reactive low voltage ion plating, and dual ion beam sputtering. The laser damage thresholds of these coatings are determined at 1064 and 355 run using a nanosecond pulsed YAG laser and a one-on-one test procedure. The results are associated with a complete characterization of the samples: refractive index n measured by spectrophotometry, extinction coefficient k measured by photothermal deflection, and roughness measured by atomic force microscopy. (C) 2008 Optical Society of America.

引用

页码：C107 / C113

页数：7

共 19 条

[1]

Alvisi M., 2002, THIN SOLID FILMS, V410, P86

[2] Evaporation and ion assisted deposition of HfO2 coatings:: Some key points for high power laser applications [J].

Andre, B ;

Poupinet, L ;

Ravel, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (05) :2372-2377

[3] Metal-dielectric light absorbers manufactured by ion plating [J].

Cathelinaud, M ;

Lemarquis, F ;

Loesel, J ;

Cousin, B .

ADVANCES IN OPTICAL THIN FILMS, 2003, 5250 :511-518

[4] REACTIVE EVAPORATION OF LOW-DEFECT DENSITY HAFNIA [J].

CHOW, R ;

FALABELLA, S ;

LOOMIS, GE ;

RAINER, F ;

STOLZ, CJ ;

KOZLOWSKI, MR .

APPLIED OPTICS, 1993, 32 (28) :5567-5574

[5] Characterization of optical coatings by photothermal deflection [J].

Commandre, M ;

Roche, P .

APPLIED OPTICS, 1996, 35 (25) :5021-5034

[6] Multiwavelength imaging of defects in ultraviolet optical materials [J].

During, A ;

Fossati, C ;

Commandré, M .

APPLIED OPTICS, 2002, 41 (16) :3118-3126

[7] Laser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering [J].

Gallais, L. ;

Krol, H. ;

Natoli, J. Y. ;

Commandre, M. ;

Cathelinaud, M. ;

Roussel, L. ;

Lequime, M. ;

Amra, C. .

THIN SOLID FILMS, 2007, 515 (7-8) :3830-3836

[8] Simultaneous absorption, scattering, and luminescence mappings for the characterization of optical coatings and surfaces [J].

Gallais, L ;

Commandré, M .

APPLIED OPTICS, 2006, 45 (07) :1416-1424

[9]

*ISO, 2000, 112541 ISO 1

[10]

Kozlowski MR, 1995, THIN FILMS OPTICAL S, P521

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