Structural properties of electrodeposited Co/Cu multilayers

被引:23
作者
El Fanity, H
Rahmouni, K
Bouanani, M
Dinia, A
Shmerber, G
Meny, C
Panissod, P
Cziraki, A
Cherkaoui, F
Berrada, A
机构
[1] Fac Sci Rabat, Rabat, Morocco
[2] Universite Louis Pasteur, GEMM, IPCMS, CNRS,UMR 46, F-67037 Strasbourg, France
[3] Eotvos Lorand Univ, Inst Solid State Phys, H-1088 Budapest, Hungary
关键词
electrodeposition; Co/Cu; multilayers; structure;
D O I
10.1016/S0040-6090(97)01181-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Co/Cu multilayers have been grown by electrodeposition using a potentiostatic technique in a single electrolyte bath based on CoSO4, H3BO3 and CuSO4. X-ray diffraction performed on these multilayers have shown polycrystalline fee structure of both Co and Cu layers with preferential (111) texture. Nuclear magnetic resonance spectrum has been recorded at 4.2 K on [Co(6 nm)/Cu(4 nm)](25) and has shown a resonance line at 216 MHz which confirms the fee structure of Co layers. The analysis of the spectrum showed on one hand that the Co layers are not pure and contain approximately 1.5% of Cu, but on the other hand, the interfaces are of good quality. A cross-sectional on transmission electron micrograph showed a columnar growth morphology. Resistivity measurements performed on this sample presented a giant magnetoresistance (GMR) effect of about 4% at room temperature. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:227 / 230
页数:4
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