Intensity-dependent reflectance and transmittance of semiconductor periodic structures

被引:12
作者
Brzozowski, L
Sukhovatkin, V
Sargent, ETH
SpringThorpe, ATJ
Extavour, M
机构
[1] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 1A4, Canada
[2] Nortel Networks, Nepean, ON K1Y 4H7, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
all-optical elements; Kerr nonlinearity; nonlinear optics; nonlinear periodic structures; saturation of absorption; semiconductor multi-quantum-wells;
D O I
10.1109/JQE.2003.813195
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The intensity-dependent response of nonlinear Bragg-periodic epitaxially-grown InGaAs-InAlGaAs-based optical elements is reported over a broad spectral range 1.3-1.6 mum. Large changes in the transmittance and reflectance are observed as a function of incident power. Over most of this spectral region, the nonlinear response is dominated by the saturation of absorption. In the vicinity of 1.5 mum, the optical elements exhibit fluence-dependent Bragg diffraction. For low incident powers, the indices of refraction of structures are uniform and no coherent scattering takes place. With increased incident power a Bragg grating appears, resulting in the emergence of a fluence-dependent stopband in the transmittance and reflectance spectra.
引用
收藏
页码:924 / 930
页数:7
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