Aerosol-assisted formation of mesostructured thin films

被引：31

作者：

Lu, YF

McCaughey, BF

Wang, DH

Hampsey, JE

Doke, N

Yang, ZZ

Brinker, CJ ^{[1
]}

机构：

[1] Tulane Univ, Dept Chem Engn, New Orleans, LA 70118 USA

[2] Univ New Mexico, Dept Chem & Nucl Engn, Albuquerque, NM 87131 USA

[3] Univ New Mexico, Sandia Natl Labs, Albuquerque, NM 87131 USA

[4] Chinese Acad Sci, State Key Lab Polymer Phys & Chem, Ctr Mol Sci, Inst Chem, Beijing 100080, Peoples R China

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 20期

关键词：

D O I：

10.1002/adma.200305331

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new aerosol-assisted surfactant self-assembly approach has been developed for large-scale mesostructured silica thin film fabrication. The formation mechanism involves coalescence of semisolid surfactant-silica mesostructured particles on substrates (see Figure) and subsequent reassembly of the mesostructures to adapt the morphology transformation from spherical to planar shape.

引用

收藏

页码：1733 / +

页数：5

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