Mechanical behavior and oxidation resistance of Cr(Al)N coatings

被引:62
作者
Sánchez-López, JC
Martínez-Martínez, D
López-Cartes, C
Fernández, A
Brizuela, M
García-Luis, A
Oñate, JI
机构
[1] Univ Seville, Inst Ciencia Mat Sevilla, CSIC, Seville 41092, Spain
[2] Fdn Inasmet, Donostia San Sebastian 20009, Spain
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2005年 / 23卷 / 04期
关键词
D O I
10.1116/1.1946711
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nanocrystalline chromium nitride and ternary chromium aluminium nitride thin films were deposited by reactive magnetron sputtering of Cr and Al targets in argon/nitrogen atmosphere varying the sputtering power and gas composition. The coatings were characterized in terms of crystal phase, chemical composition, microstructure, and mechanical properties by x-ray diffraction, x-ray photoelectron spectroscopy, including x-ray-induced Auger electron spectroscopy, transmission electron microscopy, selected-area electron diffraction, electron energy-loss spectroscopy, cross-sectional scanning electron microscopy, and ultramicrohardness tester. The incorporation of Al in the composition of the films produces an increase in the mechanical properties (hardness and reduced Young's modulus) and an increased thermal resistance against oxidation in comparison to the pure CrN composition. The hardness behavior was attributed mainly to a reduction of the CrN crystallite size according to a Hall-Petch relationship. The oxidation resistance was evaluated after annealing both types of coatings in air up to 800 degrees C. The oxygen content and the crystallite size appear almost unaltered in the CrAIN in contrast to the pure CrN films where the oxidation and grain growth is very noticeable at 800 degrees C. This improvement in thermal stability in air is explained by the formation of a nanocomposite structure of small CrN crystals embedded in an amorphous aluminum oxide or oxinitride matrix that prevents the CrN phase from crystal growth and further oxidation. (c) 2005 American Vacuum Society.
引用
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页码:681 / 686
页数:6
相关论文
共 23 条
[1]   EFFECTS OF HIGH-FLUX LOW-ENERGY (20-100 EV) ION IRRADIATION DURING DEPOSITION ON THE MICROSTRUCTURE AND PREFERRED ORIENTATION OF TI0.5AL0.5N ALLOYS GROWN BY ULTRA-HIGH-VACUUM REACTIVE MAGNETRON SPUTTERING [J].
ADIBI, F ;
PETROV, I ;
GREENE, JE ;
HULTMAN, L ;
SUNDGREN, JE .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (12) :8580-8589
[2]   The nanostructure and mechanical properties of PVD CrCu (N) coatings [J].
Baker, MA ;
Kench, PJ ;
Joseph, MC ;
Tsotsos, C ;
Leyland, A ;
Matthews, A .
SURFACE & COATINGS TECHNOLOGY, 2003, 162 (2-3) :222-227
[3]   High-temperature oxidation resistance of Cr1-xAlxN thin films deposited by reactive magnetron sputtering [J].
Banakh, O ;
Schmid, PE ;
Sanjinés, R ;
Lévy, E .
SURFACE & COATINGS TECHNOLOGY, 2003, 163 :57-61
[4]   Characterization of nitride coatings by XPS [J].
Bertóti, I .
SURFACE & COATINGS TECHNOLOGY, 2002, 151 :194-203
[5]   Surface chemical changes induced by low-energy ion bombardment in chromium nitride layers [J].
Bertóti, I ;
Mohai, M ;
Mayrhofer, PH ;
Mitterer, C .
SURFACE AND INTERFACE ANALYSIS, 2002, 34 (01) :740-743
[6]   Comparison of structural and chemical properties of Cr-based hard coatings [J].
Cekada, M ;
Panjan, P ;
Macek, M ;
Smíd, P .
SURFACE & COATINGS TECHNOLOGY, 2002, 151 :31-35
[7]   High power pulsed magnetron sputtered CrNx films [J].
Ehiasarian, AP ;
Münz, WD ;
Hultman, L ;
Helmersson, U ;
Petrov, I .
SURFACE & COATINGS TECHNOLOGY, 2003, 163 :267-272
[8]   Effect of N2 partial pressure on the microstructure and mechanical properties of magnetron sputtered CrNix films [J].
Han, ZH ;
Tian, JW ;
Lai, QX ;
Yu, XJ ;
Li, GY .
SURFACE & COATINGS TECHNOLOGY, 2003, 162 (2-3) :189-193
[9]  
HOFMANN S, 1990, WERKST KORROS, V41, P756
[10]   Characterization of the arc ion-plated CrN coatings oxidized at elevated temperatures [J].
Hsieh, WP ;
Wang, WC ;
Wang, CC ;
Shieu, FS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (05) :2235-2243